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Semiconductor
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Precision
Wafer Grinding

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Precision Semiconductor Wafer Grinding

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THAT performs high-volume precision semiconductor wafer grinding at its state-of-the-art processing center. THAT grinds wafers to submicron TTVs, which is a prerequisite to the tight tolerances required for bonded wafer, dielectric isolation, MEMS, optical devices, and other precision technologies.  

Strasbaugh 7AF precision grinder

wafer thickness measurement system

wafer polishing operation

wafer cleaning station

 


Equipment:

  • Strasbaugh 7AF precision grinder
  • Temp controlled spindle, temp controlled process water
  • MTI 200SA wafer thickness measurement system
  • RCA1 cleaning capabilities
  • HEPA laminar flow hoods
  • Nomarski Microscope
Facilities:
  • 670 sq ft white room grinding center
  • 675 sq ft Class 10000 clean room for RCA1 cleaning (Class 100 under hoods)
  • DI water system
  • Ambient temperature and humidity control
 
   
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